On the anomalous peak at low and moderate frequency C-V curves of Al/SiO2/p-Si structure at the forward bias region

dc.contributor.authorYücedağ, İbrahim
dc.date.accessioned2020-04-30T23:20:05Z
dc.date.available2020-04-30T23:20:05Z
dc.date.issued2009
dc.departmentDÜ, Teknik Eğitim Fakültesi, Elektronik ve Bilgisayar Eğitimi Bölümüen_US
dc.descriptionCondensed Matter Physics Conference of Balkan Countries -- MAY 26-28, 2008 -- Univ Mugla, Mugla, TURKEYen_US
dc.descriptionWOS: 000268723400020en_US
dc.description.abstractThe low and moderate frequency capacitance-voltage (C-V) and conductance-voltage (G/omega-V) characteristics of the Al/SiO2/p-Si (MIS) structures were investigated by considering the effect of interface states (N-ss) and series resistance (R-s). Experimental results show that in the existence of R-s the forward bias C-V curves exhibit a peak at efficiently high bias region, and this peak positions shift toward lower bias voltage with decreasing frequency. In addition, the values of C and G/omega) of these structures increase with decreasing frequency. The doping densities of acceptor atoms (N-A) and barrier height (Phi(B)) obtained from the slope of the C-2 vs. V plot in the inversion region at each frequency. The values of N-A give a minimum at 0.7 kHz while the values of Phi(B) increase with increasing frequency. In addition, the values of R-s and N-ss calculated using Nicollian and Goetzberger and Hill-Coleman methods, respectively. It has been seen that the values of R-s and N-ss decrease with increasing frequency.en_US
dc.identifier.endpage615en_US
dc.identifier.issn1842-6573
dc.identifier.issue6en_US
dc.identifier.scopusqualityQ4en_US
dc.identifier.startpage612en_US
dc.identifier.urihttps://hdl.handle.net/20.500.12684/3927
dc.identifier.volume3en_US
dc.identifier.wosWOS:000268723400020en_US
dc.identifier.wosqualityQ4en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherNatl Inst Optoelectronicsen_US
dc.relation.ispartofOptoelectronics And Advanced Materials-Rapid Communicationsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectMIS structureen_US
dc.subjectFrequency dependenceen_US
dc.subjectInsulator layeren_US
dc.subjectInterface statesen_US
dc.subjectSeries resistanceen_US
dc.titleOn the anomalous peak at low and moderate frequency C-V curves of Al/SiO2/p-Si structure at the forward bias regionen_US
dc.typeArticleen_US

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