A quartz crystal microbalance (QCM)-based easy setup device for real-time mass change detection under high-power RF plasma

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dc.authoridSenturk, Fatih/0000-0002-2436-3362en_US
dc.authorscopusid57223847596en_US
dc.authorscopusid24477457500en_US
dc.authorscopusid58313715800en_US
dc.authorscopusid58312924800en_US
dc.authorwosidSenturk, Fatih/AEI-3613-2022en_US
dc.contributor.authorSenturk, Fatih
dc.contributor.authorKocum, Ismail Cengiz
dc.contributor.authorSeyitoglu, Melek Ilayda
dc.contributor.authorAksan, Eda Sevval
dc.date.accessioned2024-08-23T16:04:29Z
dc.date.available2024-08-23T16:04:29Z
dc.date.issued2023en_US
dc.departmentDüzce Üniversitesien_US
dc.description.abstractSensing technologies serve a crucial role in monitoring and testing surface properties in biosensors, thin films, and many other industries. Plasma treatments are routinely used in most of these technologies to modify the surfaces of materials. However, due to the high radio frequency (RF) noise in plasma processes, real-time surface tracking is still rather difficult. In this study, we aim to construct an easy-to-set up mass change detection system capable of operating under RF plasma conditions. For this purpose, we have presented a novel technique that utilizes the quartz crystal microbalance sensor to detect mass changes in different plasma environments. The constructed device was then tested under 13.56 MHz, 100 W plasma atmosphere. The results showed that the resonance frequency of a crystal was successfully measured with 1.0 Hz resolution under the impact of plasma-induced high power of RF noise. Moreover, as a preliminary study, we used ethylenediamine (EDA) to track changes in resonance frequency under plasma conditions and observed noise-free signals in frequency-voltage curves. Furthermore, the system's sensitivity was found to be 3.8 ng/Hz, with a test molecule (EDA) deposition of about 380 ng in the RF plasma atmosphere. Overall, this study focused on creating a relatively new approach for detecting the real-time mass change in a strong RF environment, which we believe could be an improved and easy-to-set up technique for plasma-based processes such as surface coating, etching, and activation.en_US
dc.description.sponsorshipScientific and Technological Research Council of Turkiye (TUBITAK) [2209-A]en_US
dc.description.sponsorshipThis study was supported by the Scientific and Technological Research Council of Turkiye (TUBITAK) by the Grant No. 2209-A program. A patent application has been submitted for this constructed device. The authors would like to thank radio amateurs who contributed to the development of NanoVNA.en_US
dc.identifier.doi10.1063/5.0142016
dc.identifier.issn0034-6748
dc.identifier.issn1089-7623
dc.identifier.issue6en_US
dc.identifier.pmid37862482en_US
dc.identifier.scopus2-s2.0-85161799314en_US
dc.identifier.scopusqualityQ2en_US
dc.identifier.urihttps://doi.org/10.1063/5.0142016
dc.identifier.urihttps://hdl.handle.net/20.500.12684/14230
dc.identifier.volume94en_US
dc.identifier.wosWOS:001004313200003en_US
dc.identifier.wosqualityQ3en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.indekslendigikaynakPubMeden_US
dc.language.isoenen_US
dc.publisherAip Publishingen_US
dc.relation.ispartofReview of Scientific Instrumentsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectImpedanceen_US
dc.subjectSystemsen_US
dc.subjectFilmsen_US
dc.subjectQcmen_US
dc.titleA quartz crystal microbalance (QCM)-based easy setup device for real-time mass change detection under high-power RF plasmaen_US
dc.typeArticleen_US

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