Solid phase epitaxial thickening of boron and phosphorus doped polycrystalline silicon thin films formed by aluminium induced crystallization technique on glass substrate

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dc.contributor.authorÖzmen, Özge Tüzün
dc.contributor.authorKaraman, Mehmet
dc.contributor.authorSedani, Salar Habibpur
dc.contributor.authorSagban, H. Muzaffer
dc.contributor.authorTuran, Raşit
dc.date.accessioned2020-04-30T23:32:02Z
dc.date.available2020-04-30T23:32:02Z
dc.date.issued2019
dc.departmentDÜ, Fen-Edebiyat Fakültesi, Fizik Bölümüen_US
dc.descriptionWOS: 000485256900018en_US
dc.description.abstractAluminium induced crystallization (AIC) technique can be used to form the high-quality and large-grained polycrystalline silicon (poly-Si) thin films, which are with the thickness of similar to 200 nm and used as a seed layer, on silicon nitride coated glass substrate. Thanks to aluminium metal in AIC process, the natural doping of AIC thin films is p(+) type (similar to 2 x 10(18) cm(-3)). On the other hand, recombination of carriers can be controlled by partial doping through the defects that may have advantages to improve the thin film quality by the overdoping induced passivation. In this study, boron (B) and phosphorus (P) doped AIC seed layers were thicken to similar to 2 mu m by solid phase epitaxy (SPE) technique at 800 degrees C for 3 h under nitrogen flow in a tube furnace. During the crystallization annealing, exodiffusion of dopants was formed through the SPE film from the AIC seed layer. Optical microscope and electron back scattering diffraction technique (EBSD) were used to analyse the structural quality of the Si films. The poly-Si layer with an average grain size value of similar to 32 mu m was formed by AIC + SPE technique for P doped samples while EBSD analysis gave no results for B doped samples due to the quite deterioration on the surface of the films. AIC + SPE films were analyzed in terms of structural properties by using micro-Raman Spectroscopy and X-ray diffraction systems. The results showed that the crystallinity of compressive stress formed AIC + SPE films reached up to 98.55%. Additionally, the Raman analysis pointed out that no temperature-induced stress were generated in the AIC + SPE films while compressive stress was induced by increasing the annealing duration for doped AIC film. For all samples, the preferred orientation was < 100 >, and the crystallite size up to 44.4 nm was formed by phosphorus doping of AIC films. The doping efficiency was determined by time-of-flight secondary ion mass spectroscopy for doped samples. A graded n(+)n doping profile was obtained by exo-diffusion of phosphorus from the overdoped seed layer during the epitaxial thickening while boron doping of SPE film has failed with exo-diffusion of boron from AIC seed layer into SPE film. Finally, high-quality n(+)n type poly-Si films were fabricated on glass substrate by using AIC + SPE technique.en_US
dc.description.sponsorshipTUBITAKTurkiye Bilimsel ve Teknolojik Arastirma Kurumu (TUBITAK) [112T084]; Scientific Research Project Fund of Duzce UniversityDuzce University [2017.05.02.623]en_US
dc.description.sponsorshipThis work has been funded by TUBITAK under the project number 112T084 and the Scientific Research Project Fund of Duzce University under the project number 2017.05.02.623.en_US
dc.identifier.doi10.1016/j.tsf.2019.137451en_US
dc.identifier.issn0040-6090
dc.identifier.scopusqualityQ2en_US
dc.identifier.urihttps://doi.org/10.1016/j.tsf.2019.137451
dc.identifier.urihttps://hdl.handle.net/20.500.12684/4577
dc.identifier.volume689en_US
dc.identifier.wosWOS:000485256900018en_US
dc.identifier.wosqualityQ3en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherElsevier Science Saen_US
dc.relation.ispartofThin Solid Filmsen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectPolycrystalline siliconen_US
dc.subjectThin filmen_US
dc.subjectAluminium induced crystallizationen_US
dc.subjectSolid phase epitaxyen_US
dc.subjectDoping processen_US
dc.subjectGlass substrateen_US
dc.titleSolid phase epitaxial thickening of boron and phosphorus doped polycrystalline silicon thin films formed by aluminium induced crystallization technique on glass substrateen_US
dc.typeArticleen_US

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