Optical Characterization of Amorphous Hydrogenated Carbon (a-C:H) Thin Films Prepared by Single RF Plasma Method

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dc.contributor.authorMansuroğlu, Doğan
dc.contributor.authorGökşen, Kadir
dc.contributor.authorBilikmen, Sinan
dc.date.accessioned2020-04-30T23:20:15Z
dc.date.available2020-04-30T23:20:15Z
dc.date.issued2015
dc.departmentDÜ, Fen-Edebiyat Fakültesi, Fizik Bölümüen_US
dc.descriptionMansuroglu, Dogan/0000-0001-8721-2118en_US
dc.descriptionWOS: 000355138400009en_US
dc.description.abstractMethane (CH4) plasma was used to produce amorphous hydrogenated carbon (a-C:H) films by a single capacitively coupled radio frequency (RF) powered plasma system. The system consists of two parallel electrodes: the upper electrode is connected to 13.56 MHz RF power and the lower one is connected to the ground. Thin films were deposited on glass slides with different sizes and on silicon wafers. The influence of the plasma species on film characteristics was studied by changing the plasma parameters. The changes of plasma species during the deposition were investigated by optical emission spectroscopy (OES). The structural and optical properties were analyzed via Fourier transform infrared (FTIR) spectroscopy, X-ray diffraction (XRD) and UV-visible spectroscopy, and the thicknesses of the samples were measured by a profilometer. The sp(3)/sp(2) ratio and the existing H atoms play a significant role in the determination of the chemical properties of thin films in the plasma. The film quality and deposition rate were both increased by raising the power and the flow rate.en_US
dc.description.sponsorshipScientific Research Project Fund of Duzce UniversityDuzce University [2013.05.02.195]en_US
dc.description.sponsorshipThis work is supported by the Scientific Research Project Fund of Duzce University under the project number 2013.05.02.195.en_US
dc.identifier.doi10.1088/1009-0630/17/6/09en_US
dc.identifier.endpage495en_US
dc.identifier.issn1009-0630
dc.identifier.issue6en_US
dc.identifier.scopusqualityQ3en_US
dc.identifier.startpage488en_US
dc.identifier.urihttps://doi.org/10.1088/1009-0630/17/6/09
dc.identifier.urihttps://hdl.handle.net/20.500.12684/3968
dc.identifier.volume17en_US
dc.identifier.wosWOS:000355138400009en_US
dc.identifier.wosqualityQ4en_US
dc.indekslendigikaynakWeb of Scienceen_US
dc.indekslendigikaynakScopusen_US
dc.language.isoenen_US
dc.publisherIop Publishing Ltden_US
dc.relation.ispartofPlasma Science & Technologyen_US
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjecta-C:H thin filmen_US
dc.subjectplasma depositionen_US
dc.subjectmethane plasmaen_US
dc.subjectsp(3)/sp(2) ratioen_US
dc.titleOptical Characterization of Amorphous Hydrogenated Carbon (a-C:H) Thin Films Prepared by Single RF Plasma Methoden_US
dc.typeArticleen_US

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